Skip navigation

Electromigration in Sn-Ag solder thin films under high current density

Electromigration in Sn-Ag solder thin films under high current density

Zhu, X., Kotadia, H., Xu, S., Lu, H. ORCID: 0000-0002-4392-6562, Mannan, S. H., Bailey, C. ORCID: 0000-0002-9438-3879 and Chan, Y. C. (2014) Electromigration in Sn-Ag solder thin films under high current density. Thin Solid Films, 565. pp. 193-201. ISSN 0040-6090 (doi:https://doi.org/10.1016/j.tsf.2014.06.030)

Full text not available from this repository. (Request a copy)

Abstract

The electro-migration behavior of a Sn-Ag solder thin film stripe that is deposited on a glass substrate has been investigated under a high current density in the absence ofthermo-migration. The distribution of voids and hillocks at current densities of 4.4-6.0 × 104 A/cm2 has been analyzed optically and using electron microscopy. The voids mainly formed at the cathode side of the stripe where maximum current density was predicted but voids also formed along a line that crosses the stripe. This was explained in terms of the initial voids forming at locations of maximum current density concentration, altering these locations, and then expanding into them. The movement of the maximum current density location is caused by redistribution of current as the voids form. An atomic migration model has been developed and used in this work. It was found that if thermal gradients were completely neglected, the model was unable to account for the divergence of atomic flux density which is necessary for void nucleation. However, the temperature dependence of the diffusivity of atoms is sufficient to account for void nucleation within the timescale of the experiments.

Item Type: Article
Additional Information: [1] Acknowledgments (funding): Xiaoxin Zhu would like to thank the University of Greenwich (University Bursary Ref. No: RAE Fund 13265-R09803) for financing his research work. Sha Xu would like to thank HK RGC GRF (Project No. 111309; City University of Hong Kong, Ref No: 9041486).
Uncontrolled Keywords: Electromigration; Thermomigration; Modelling; Solder material; Thin film
Subjects: Q Science > QA Mathematics
Q Science > QD Chemistry
Faculty / Department / Research Group: Faculty of Architecture, Computing & Humanities
Faculty of Architecture, Computing & Humanities > Centre for Numerical Modelling & Process Analysis (CNMPA)
Faculty of Architecture, Computing & Humanities > Centre for Numerical Modelling & Process Analysis (CNMPA) > Computational Mechanics & Reliability Group (CMRG)
Related URLs:
Last Modified: 20 May 2019 15:39
Selected for GREAT 2016: GREAT a
Selected for GREAT 2017: None
Selected for GREAT 2018: None
Selected for GREAT 2019: GREAT 1
URI: http://gala.gre.ac.uk/id/eprint/12050

Actions (login required)

View Item View Item