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Electrodeposition of copper into high aspect ratio PCB micro-via using megasonic agitation

Electrodeposition of copper into high aspect ratio PCB micro-via using megasonic agitation

Costello, S., Strusevich, N., Flyyn, D., Kay, R.W., Patel, M.K., Bailey, C. ORCID: 0000-0002-9438-3879, Price, D., Bennet, M., Jones, A.C. and Desmulliez, M.P.Y. (2012) Electrodeposition of copper into high aspect ratio PCB micro-via using megasonic agitation. In: DTIP 2012 Conference 2012: Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS. EDA Publishing Association, Grenoble, France, pp. 98-102. ISBN 9782355000201

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Abstract

This paper presents the use of micro-particle imaging velocimetry (micro-PIV) to analyse fluid flow and hence ion replenishment in PCB micro-via during the electroplating process. Megasonic streaming is used to remove bubbles from blind micro-via and promote ion transportation within high aspect ratio PCB micro-via to enhance electrodeposition.

Item Type: Conference Proceedings
Title of Proceedings: DTIP 2012 Conference 2012: Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS
Additional Information: [1] This paper was first presented at the 2012 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP 2012) held from 25-27 April 2012 in Cannes, France. [2] ISBN: 9781467307857 (IEEE); 9782355000201 (EDA).
Uncontrolled Keywords: electrodeposition, micro-particle imaging velocimetry (micro-PIV), fluid flow, electrodeposition of copper, megasonic agitation
Subjects: Q Science > QA Mathematics > QA76 Computer software
Q Science > QC Physics
Q Science > QD Chemistry
Pre-2014 Departments: School of Computing & Mathematical Sciences
School of Computing & Mathematical Sciences > Centre for Numerical Modelling & Process Analysis > Computational Mechanics & Reliability Group
Related URLs:
Last Modified: 13 Mar 2019 11:34
URI: http://gala.gre.ac.uk/id/eprint/10817

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