Electrodeposition of copper into high aspect ratio PCB micro-via using megasonic agitation
Costello, S., Strusevich, N., Flyyn, D., Kay, R.W., Patel, M.K., Bailey, C. ORCID: 0000-0002-9438-3879, Price, D., Bennet, M., Jones, A.C. and Desmulliez, M.P.Y. (2012) Electrodeposition of copper into high aspect ratio PCB micro-via using megasonic agitation. In: DTIP 2012 Conference 2012: Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS. EDA Publishing Association, Grenoble, France, pp. 98-102. ISBN 9782355000201
Full text not available from this repository.Abstract
This paper presents the use of micro-particle imaging velocimetry (micro-PIV) to analyse fluid flow and hence ion replenishment in PCB micro-via during the electroplating process. Megasonic streaming is used to remove bubbles from blind micro-via and promote ion transportation within high aspect ratio PCB micro-via to enhance electrodeposition.
Item Type: | Conference Proceedings |
---|---|
Title of Proceedings: | DTIP 2012 Conference 2012: Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS |
Additional Information: | [1] This paper was first presented at the 2012 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP 2012) held from 25-27 April 2012 in Cannes, France. [2] ISBN: 9781467307857 (IEEE); 9782355000201 (EDA). |
Uncontrolled Keywords: | electrodeposition, micro-particle imaging velocimetry (micro-PIV), fluid flow, electrodeposition of copper, megasonic agitation |
Subjects: | Q Science > QA Mathematics > QA76 Computer software Q Science > QC Physics Q Science > QD Chemistry |
Pre-2014 Departments: | School of Computing & Mathematical Sciences School of Computing & Mathematical Sciences > Centre for Numerical Modelling & Process Analysis > Computational Mechanics & Reliability Group |
Related URLs: | |
Last Modified: | 13 Mar 2019 11:34 |
URI: | http://gala.gre.ac.uk/id/eprint/10817 |
Actions (login required)
View Item |