Stoyanov, Stoyan ORCID: 0000-0001-6091-1226 and Marson, Silvia (2011) Model assisted process control in micro- and nano-fabrication using focused ion beam. In: Electronics Technology (ISSE), 2011 34th International Spring Seminar on. Institute of Electrical and Electronics Engineers, Inc., Piscataway, NJ, USA, pp. 424-429. ISBN 978-1-4577-2111-3 ISSN 2161-2528 (doi:https://doi.org/10.1109/ISSE.2011.6053900)

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Abstract

The major interest in Focused Ion Beam (FIB) has been driven by the potential of the process to enable the fabrication of precision engineering parts, high resolution patterns and micro-moulds required in applications such as the manufacturing of miniaturised components for various heterogeneous systems, micro-fluidics, bio-medical, MEMS, and embedded electronic test devices. A major issue with realising the milling capability of FIB is associated with the ability to accurately control the depth variation. A computational model that predicts the milling depth as function of the ion beam scanning frequency and a number of process parameters is investigated and experimentally validated. The model can assist in specifying optimal FIB process parameters for achieving accurate shapes of the intended micro- or nano-features.

Item Type:	Conference Proceedings
Title of Proceedings:	Electronics Technology (ISSE), 2011 34th International Spring Seminar on
Additional Information:	[1] Paper published in proceedings of 2011 34th International Spring Seminar on Electronics Technology (ISSE), held 11-15 May 2011, Tratanska Lomnica, Slovakia.
Uncontrolled Keywords:	Focused Ion Beam (FIB), micro-fabrication, nano-fabrication, precision engineering, modelling
Subjects:	Q Science > QA Mathematics > QA75 Electronic computers. Computer science
Pre-2014 Departments:	School of Computing & Mathematical Sciences School of Computing & Mathematical Sciences > Department of Mathematical Sciences
Related URLs:	Publisher Publisher
Last Modified:	14 Oct 2016 09:18
URI:	http://gala.gre.ac.uk/id/eprint/7355

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