Tian, Y., Shang, X., Wang, Yi and Lancaster, M. (2015) Investigation of SU8 as A Structural Material for Fabricating Passive Millimetre-wave and Terahertz Components. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14 (4):044507. ISSN 1932-5150 (Print), 1932-5134 (Online) (doi:https://doi.org/10.1117/1.JMM.14.4.044507)

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Abstract

This paper is to provide a systematical review of the technical issues of SU8 fabrication for millimeter-wave and terahertz components based on research works carried out at the University of Birmingham in the past decade. A design-for-manufacturability (DFM) approach is followed. The flexibility of the SU8 process enables many novel device structures. Challenges and problems during the fabrication will be discussed and demonstrated with examples. The measurement of the devices is also a significant challenge when the critical dimensions of the device shrink and special testing fixtures are needed in some cases. Finally, a brief overview of the issues discussed above is given for future guidance.

Item Type:	Article
Additional Information:	© 2016 Society of Photo-Optical Instrumentation Engineers. One print or electronic copy may be made for personal use only. Systematic reproduction and distribution, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper are prohibited.
Uncontrolled Keywords:	SU8 photolithography; millimeter-wave and terahertz components
Faculty / School / Research Centre / Research Group:	Faculty of Engineering & Science > School of Engineering (ENG)
Last Modified:	03 Jan 2017 15:36
URI:	http://gala.gre.ac.uk/id/eprint/14182

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