Computational modelling and optimisation of the fabrication of nano-structures using focused ion beam and imprint forming technologies
Stoyanov, S., Bailey, C., Tang, Y.K., Marson, S., Dyer, A., Allen, D. and Desmulliez, M. (2010) Computational modelling and optimisation of the fabrication of nano-structures using focused ion beam and imprint forming technologies. Journal of Physics: Conference Series (JPCS), 253 (1):012008. ISSN 1742-6588 (Print), 1742-6596 (Online) (doi:10.1088/1742-6596/252/1/012008)Full text not available from this repository.
Focused Ion Beam (FIB) and Nano-Imprint Forming (NIF) have gained recently major interest because of their potential to enable the fabrication of precision engineering parts
and to deliver high resolution, low-cost and high-throughput production of fine sub-micrometre structures respectively. Using computational modelling and simulation becomes increasingly important in assessing capabilities and risks of defects with respect to product
manufacturability, quality, reliability and performance, as well as controlling and optimising the process parameters. A computational model that predicts the milling depth as function of the ion beam dwell times and a number of process parameters in the case of FIB milling is
investigated and experimentally validated. The focus in the NIF study is on modelling the material deformation and the filling of the pattern grooves during the mould pressing using non-linear large deformation finite element analysis with hyperelastic non-compressive material behaviour. Simulation results are used to understand the risk of imperfections in the pattern replication and to identify the optimal process parameters and their interaction.
Actions (login required)