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China’s high-tech industry
Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: https://orcid.org/0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:10.1016/j.hitech.2017.04.007)
Data Envelopment Analysis (DEA)
Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: https://orcid.org/0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:10.1016/j.hitech.2017.04.007)
Pure technical efficiency (PTE)
Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: https://orcid.org/0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:10.1016/j.hitech.2017.04.007)
R&D investment efficiency
Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: https://orcid.org/0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:10.1016/j.hitech.2017.04.007)
Scale efficiency (SE)
Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: https://orcid.org/0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:10.1016/j.hitech.2017.04.007)
Technical efficiency (TE)
Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: https://orcid.org/0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:10.1016/j.hitech.2017.04.007)