China’s high-tech industry

Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: 0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:https://doi.org/10.1016/j.hitech.2017.04.007)

Data Envelopment Analysis (DEA)

Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: 0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:https://doi.org/10.1016/j.hitech.2017.04.007)

Pure technical efficiency (PTE)

Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: 0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:https://doi.org/10.1016/j.hitech.2017.04.007)

R&D investment efficiency

Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: 0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:https://doi.org/10.1016/j.hitech.2017.04.007)

Scale efficiency (SE)

Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: 0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:https://doi.org/10.1016/j.hitech.2017.04.007)

Technical efficiency (TE)

Han, Chunjia, Thomas, Stephen Rhys, Yang, Mu, Ieromonachou, Petros ORCID: 0000-0002-5842-9585 and Zhang, Hongru (2017) Evaluating R&D investment efficiency in China's high-tech industry. Journal of High Technology Management Research, 28 (1). pp. 93-109. ISSN 1047-8310 (doi:https://doi.org/10.1016/j.hitech.2017.04.007)