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Classification of carbon nanostructure families occurring in a chemically activated arc discharge reaction

Classification of carbon nanostructure families occurring in a chemically activated arc discharge reaction

Dallas, P., Meysami, S. S. ORCID: 0000-0003-1702-1353, Grobert, N. and Porfyrakis, K. ORCID: 0000-0003-1364-0261 (2016) Classification of carbon nanostructure families occurring in a chemically activated arc discharge reaction. RSC Advances, 6 (30). pp. 24912-24920. ISSN 2046-2069 (Online) (doi:https://doi.org/10.1039/c5ra26325e)

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Abstract

Controlling the generation of empty cage, endohedral metalofullerenes and carbon nanotubes is an important challenge for the tailored synthesis of functional materials and their scaled up production. However, the reaction yields for fullerenes are low and their formation mechanism is far from being elucidated thus hampering their targeted, scaled up synthesis and potential applications. We present a systematic study on the effect of the addition of copper nitrate as doping agent during an arc discharge vaporization of Gd and Nd doped rods for the production of a series of fullerenes and carbon nanotubes. The incorporation of copper nitrate at a Cu/M molar ratio in the range of 6 to 7 leads to higher yield for the high molecular weight fullerenes and endohedral fullerenes compared to small empty cages. We distinguished three different families of nanomaterials: 1) small empty cage fullerenes, 2) endohedral metalofullerenes and empty cage fullerenes with more than 88 atoms, and 3) multi-wall carbon nanotubes which were deposited on the cathode and their yield appeared to be influenced by the different reaction conditions.

Item Type: Article
Uncontrolled Keywords: chemically activated arc discharge, carbon nanostructures
Subjects: Q Science > QD Chemistry
T Technology > TA Engineering (General). Civil engineering (General)
Faculty / Department / Research Group: Faculty of Engineering & Science
Faculty of Engineering & Science > School of Engineering (ENN)
Last Modified: 24 Oct 2019 10:32
Selected for GREAT 2016: None
Selected for GREAT 2017: None
Selected for GREAT 2018: None
Selected for GREAT 2019: None
URI: http://gala.gre.ac.uk/id/eprint/25779

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